Glass photomask

We produce our photomasks in Sodalime glass or quartz (fused silica)
in several precision ranges in order to best meet your needs.

Our team will advise you on the manufacturing process of your photomask to guarantee a product suited to your requirements.

Photomasks, produced in our company, are used worldwide in high-tech fields such as the semiconductor industry, medical research, bioelectronics and aerospace.

Technical information

Substrate

Sodalime, quartz (fused silica).

Coating on substrate

Antireflective chromium.

Dimensions

3×3 to 20×24’’.

Minimum structure

0.5µm

SERVICES

COMPANY

ESTEYO © 2023 Selba S.A. – Genève. Tous droits réservés. Photos: David Marioni