Our team will advise you on the manufacturing process of your photomask to guarantee a product suited to your requirements.
Photomasks, produced in our company, are used worldwide in high-tech fields such as the semiconductor industry, medical research, bioelectronics and aerospace.
Technical information
Substrate
Sodalime, quartz (fused silica).
Coating on substrate
Antireflective chromium.
Dimensions
3x3 to 20x24’’.
Minimum structure
0.5µm